Deposition of titanium nitride thin film using glow discharge plasma (Record no. 22383)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 00763nam a22001817a 4500 |
| 040 ## - CATALOGING SOURCE | |
| Transcribing agency | Riphah International University |
| 082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER | |
| Classification number | 530.4275 |
| Author Mark | ANA |
| 100 ## - MAIN ENTRY--PERSONAL NAME | |
| Authorship | Anaiza Riaz (400364) |
| 245 ## - TITLE STATEMENT | |
| Title | Deposition of titanium nitride thin film using glow discharge plasma |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT) | |
| Place of publication | Lahore |
| Name of publisher | (unpublished) |
| Date of publication | 2017 |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | vi, 44 p. |
| Illustrations | : ill. (col.) |
| Dimensions | ; 29 cm. |
| Accompanying material | + CD |
| 500 ## - GENERAL NOTE | |
| General note | Submitted in fulfillment of the requirements for the degree of Master of Philosophy in Physics |
| 500 ## - GENERAL NOTE | |
| General note | Includes bibliographical references |
| 500 ## - GENERAL NOTE | |
| General note | Thesis supervisor: Muhammad Waqas Iqbal |
| 502 ## - DISSERTATION NOTE | |
| Dissertation note | Thesis (MS-- management science) Riphah International University, 2017 |
| 546 ## - LANGUAGE NOTE | |
| Language note | English |
| 650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Subject | Physics |
| Keywords | thin film |
| -- | titanium |
| -- | vapor |
| -- | plasma |
| -- | X-Ray |
| -- | RICAS |
| Not for loan | Home library | Current library | Source of acquisition | Full call number | Barcode | Copy number | Koha item type |
|---|---|---|---|---|---|---|---|
| NOT for LOAN | Lahore Raiwind Campus | Lahore Raiwind Campus | Riphah International University | 530.4275 ANA | 36668 | 1 | Thesis |