Computational analysis of SiH2 and SiH3 dynamics in SiH4/H2 capacitive coupled plasma (Record no. 56102)

MARC details
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fixed length control field 00848nam a22001937a 4500
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Transcribing agency Riphah International University
082 ## - DEWEY DECIMAL CLASSIFICATION NUMBER
Classification number 530
Author Mark ZOB
100 ## - MAIN ENTRY--PERSONAL NAME
Authorship Zobia Naeem (41282)
245 ## - TITLE STATEMENT
Title Computational analysis of SiH2 and SiH3 dynamics in SiH4/H2 capacitive coupled plasma
260 ## - PUBLICATION, DISTRIBUTION, ETC. (IMPRINT)
Place of publication Islamabad
Name of publisher (unpublished)
Date of publication 2024
300 ## - PHYSICAL DESCRIPTION
Extent , 28 p.
Illustrations : ill.
Dimensions ; 30 cm.
Accompanying material +CD
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General note A dissertation submitted in the partial fulfillment of the requirements for the degree of Master of Philosophy in Physics Department of Basic Sciences.
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General note Includes bibliographical references
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General note Thesis supervisor: Dr. Muhammad Waqar Ahmed
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Dissertation note Thesis (M.Phil.)--Riphah International University, 2024
546 ## - LANGUAGE NOTE
Language note English
650 ## - SUBJECT ADDED ENTRY--TOPICAL TERM
Subject Physics
Keywords Reactor dynamic
-- Energy model
-- Fluid model
-- Flow chart
-- DBS
-- FEAS
942 ## - ADDED ENTRY ELEMENTS (KOHA)
item type Thesis
Holdings
Not for loan Home library Current library Source of acquisition Full call number Barcode Copy number Koha item type
NOT for LOAN Main Campus Main Campus Riphah International University 530 ZOB 102475 1 Thesis
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