000 00873nam a22001937a 4500
999 _c46608
_d46608
040 _cRiphah International University
082 _a530
_bZAI
100 _aMuhammad Zaid (1134)
245 _aSimulation of Si2Hx density in SiH4/H2 capactive couple plasma
260 _aIslamabad
_b(Unpublished)
_c2022
300 _axiii, 59 p.
_b: ill. Col.
_c; 30 cm.
_e+CD
500 _aSubmitted in partial fulfillment of the requirements for the degree of Master of Philosophy in Physics to the Department of Basic Sciences.
500 _aIncludes bibliographical references.
500 _aThesis supervisor: Dr. Muhammad Waqar
502 _aThesis (M.Phil)--Riphah International University, 2022
546 _aEnglish
650 _aPhysics
_vCapacitive couple plasma (CCP)
_vInductive couple plasma (ICP)
_vPlasma simulation models
_vPlasma classificaions
_vDBS
_vFEAS
942 _cTH